Abstract:

        We made uniform single phase β-FeSi₂ films on Si (100) substrate with a Nd:YAG pulsed laser of 1064 nm (output wavelength), pulsed laser deposition (PLD) and thermal annealing process. We further investigated the structure and surface morphology with atomic force microscope (AFM),scanning electron microscope (SEM) and X-ray diffraction (XRD) method. Experimental results show the crystallization degree, size and shape of the grains and surface roughness are all regularly changed with the increase of sputtering time. We discovered that 40 minutes is the optimal sputtering time under the present experimental conditions after comparing the different sputtering time.

Key words: PLD, β-FeSi₂ films, sputtering time